darkroom

7th Annual Alternative Process Exhibition

Juried by: Diane Chung, Brenton Hamilton, Zack Sumner Schomp, & The Image Flow

The Image Flow invites artists to submit work to our seventh annual group exhibition of alternative process photography. Cyanotype, platinum-palladium, gum bichromate, van dyke, photogravure, tintype, ambrotype, wet plate collodion, mordançage, transfers and lifts, salt prints, hand-painted, original lumens, and any combination of alternative process photography will be considered.

Photography Artist Residency and Solo Exhibition

This residency provides an opportunity for an artist to execute a new body of work, evolve an existing body of work, or develop a project in the CHAW Darkroom and Photography space. The residency offers up to twelve weeks of time and space to an artist or team of artists to experiment and realize new work in our darkroom and photographic facilites. The selected resident(s) will be expected to begin work in November 2019. The residency culminates in a solo exhibition of work produced during the residency in March 2020 in the CHAW Gallery. 
 

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